力积电：正与美光合作开发 1P 制程 DRAM 内存，预计 2028H2 量产
IT之家 4 月 22 日消息，中国台湾地区半导体企业力晶积成电子制造股份公司（力积电、PSMC）昨日举行 2026 年第 1 季度线上法人说明会。该企业会上表示 已与美光启动 1P 制程 DRAM 内存的联合研发 ，预计 2027Q1 导入设备、2028H1 试产、2028H2
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